JSR Corp.

International public company
1-9-2 Higashi-Shinbashi, Minato-ku, Tokyo,  104-8410, Japan
()81 03 6218 3517, http://www.jsr.co.jp

Primary SIC: Synthetic Rubber, Primary NAICS: Synthetic Rubber Manufacturing
Description: Manufacturing: Manufacture of synthetic rubber, resins and emulsions, and other fine chemicals; manufacture of materials for liquid crystal displays and optical-fiber coatings, semiconductor materials.

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JSR Corp., News and Information

Publication No. WO/2009/133793 Published on Nov. 5, Assigned to JSR for Chemical Mechanical Polishing Aqueous Dispersion, Preparation Kit, Polishing Chemical Mechanical Method (Japanese Inventors)
US Fed News Service, Including US State News; 11/9/2009; 420 words; ...dispersion for chemical mechanical polishing, and method of chemical mechanical polishing. The patent has been assigned to JSR Corp., Tokyo. According to an abstract posted by the World Intellectual Property Organization: the invention deals with...

Panacea Pharmaceuticals' Series C Round Gets $7M.
BIOWORLD Today; 11/3/2009; 1058 words; ...research independently]," he said. Participants in the round included Japanese investors Mitsubishi Corp. Life Sciences Venture, Olympus, JSR, Shin-Etsu Chemical, Fuji Photo Film, Dai Nippon Printing, and Tokio Marine & Nichido Fire...

With Discovery Firms Worth Nothing,' Is Biotech Troubled?
BIOWORLD Today; 11/3/2009; 1558 words; ...million in its third round in early July, but that Series C is heavy with Japanese investors - Mitsubishi Corp. Life Sciences Venture, Olympus, JSR, Shin-Etsu Chemical, Fuji Photo Film, Dai Nippon Printing, and Tokio Marine & Nichido Fire...

Publication No. WO/2009/122853 Published on Oct. 08, Assigned to JSR for Positive Radiation-Sensitive Resin Composition, Microlens, Microlens Formation Method (Japanese Inventor)
US Fed News Service, Including US State News; 10/21/2009; 456 words; ...radiation-sensitive resin composition, microlens, and method for forming microlens. The patent has been assigned to JSR CORP., Tokyo. According to an abstract posted by the World Intellectual Property Organization, the invention aims to disclose...

Publication No. WO/2009/119583 Published on Oct. 1, Assigned to JSR for Chemical Vapor Deposition Material (Japanese Inventors)
US Fed News Service, Including US State News; 10/8/2009; 358 words; ...have developed a material for chemical vapor deposition, silicon with insulating film. The patent has been assigned to JSR Corp., Tokyo. According to an abstract posted by the World Intellectual Property Organization, the invention relates to...

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