Porous Materials Inc.

Private Company, Headquarters Location
20 Dutch Mill Rd., Ithaca, NY 14850, United States
(607)257-5544, (607)257-1586 fax, http://www.pmiapp.com

Primary SIC: Industrial Valves, Primary NAICS: Industrial Valve Manufacturing
Description: Manufacturing: Manufactures industrial pressure valves and regulators; manufactures test equipment for electronic and electrical circuits; manufactures measuring and controlling devices; testing laboratory

View this company profile - Now for a Limited Time, try Goliath Company Profiles
Free for 3 Days!

Porous Materials Inc., News and Information

Research from F. Zacharatos and co-researchers provides new data on science.(Report)
Journal of Technology; 11/17/2009; 527 words; ...present an optimized porous Si (PS) microplate...composite PS/Si substrate material. We show that the porous material has a complex...Devices (Optimized Porous Si Microplate Technology...Electronics Engineers Inc., 445 Hoes Lane...

Japan : Fujitsu Brings New Concepts to Mobile Phones.
TendersInfo; 11/16/2009; 877 words; ...that it will release from winter 2009 for NTT Docomo Inc's mobile phone subscribers. The company will release...cover of the F-02B is made of a corrosion-resistant material, and porous ceramics is used for the fragrance chip so that it...

RIVAL Technologies Inc. & Neah Power Systems, Inc. Profiled by MarketTelegraph.com.
M2 Presswire; 11/12/2009; 978 words; ...Neah Power Systems, Inc. closed at $0.99 Wednesday...Site Neah Power Systems, Inc., (OTCBB: NPWZ) announced...Power Neah Power Systems, Inc. (NPWZ) is developing...based on its proprietary porous silicon technology. Further...and uncertainties. This material is for informational purposes...

W2 Energy Inc. & Neah Power Systems, Inc.
M2 Presswire; 11/12/2009; 979 words; ...Neah Power Systems, Inc. closed at $0.99 Wednesday...Site Neah Power Systems, Inc., (OTCBB:NPWZ...Power Neah Power Systems, Inc. (NPWZ) is developing...based on its proprietary porous silicon technology. Further...and uncertainties. This material is for informational purposes...

Patent No. 7,615,482 Issued on Nov. 10, Assigned to IBM, Applied Materials for Porous Sicoh Dielectric Layer Method (New York, California Inventors)
US Fed News Service, Including US State News; 11/11/2009; 546 words; ...developed a method for porous sicoh dielectric layer...Y., and Applied Materials Inc., Santa Clara...dielectric or conductive material, a layer of oxide...increasing carbon towards a porous SiCOH layer, and a porous SiCOH (pSiCOH) layer...

Recent News Articles

Why Purchase This Company Profile?

  • Sales prospecting
  • Competitive analysis
  • Vendor & supplier evaluation
  • Customer evaluation and analysis
  • Strategic planning

Need More Information?

Start a new search

Tell Us What You Think

Take our short survey to tell us what would make Goliath more valuable to you.

Add Your Company Information to Goliath
If your company does not appear in Goliath, click here to add it.

Update Your Company Information
If your company information has changed or is not correct,
click here to let us know.