Plasma Etch Inc.

Tegal Secures Repeat Silicon DRIE Tool Order From Japan Home Market Customer
Wireless News; 11/5/2009; 542 words; ...Tegal 200 SE DRIE Silicon Etch System selected as a repeat...system is high-density plasma etch tool featuring an...Canon Marketing Japan Inc. is the independent marketing arm of Canon Inc. - wholesaling and retailing...2009 Close-Up Media, Inc. All Rights Reserved...

Tegal Receives Repeat Silicon DRIE Tool Order From Japan Home Market Customer.
Business Wire; 10/29/2009; 1290 words; ...200 SE DRIE Silicon Etch System selected as...system is high-density plasma etch tool featuring an inductively coupled plasma etch reactor and magnetic...Canon Marketing Japan Inc. is the independent marketing arm of Canon Inc. - wholesaling and...

Patent No. 7,608,196 Issued on Oct. 27, Assigned to Micron Technology for High Aspect Ratio Aperture Formation Method (Idaho Inventors)
US Fed News Service, Including US State News; 10/29/2009; 424 words; ...been assigned to Micron Technology Inc., Boise. According to the abstract...Patent & Trademark Office: "A plasma etch process for etching a dielectric material...temperature environment within the etch chamber. The two primary etchant...

Patent No. 7,608,195 Issued on Oct. 27, Assigned to Micron Technology for High Aspect Ratio Contact (Idaho Inventor)
US Fed News Service, Including US State News; 10/29/2009; 407 words; ...patent has been assigned to Micron Technology Inc., Boise. According to the abstract released...having at least fifty (50) percent He to a plasma etch reactor, and exposing the insulating layer to a plasma of the first gaseous etchant. Use of the...

ITRI and Applied Materials Collaborate to Advance 3D IC Technology.
Business Wire; 10/15/2009; 1280 words; ...ITRI) and Applied Materials, Inc. announced today a collaboration...standards. Using Applied's Etch, PVD, CMP and PECVD* systems...org.tw. Applied Materials, Inc. (Nasdaq:AMAT) is the global...mechanical planarization; PECVD = plasma enhanced chemical vapor deposition...