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Air Products' high-k Materials Enable Semiconductor Advances.

Publication: PR Newswire
Publication Date: 21-MAR-07
Format: Online
Delivery: Immediate Online Access

Article Excerpt
high-k Materials Allow Smaller, Faster Chips to Work More Efficiently

LEHIGH VALLEY, Pa., March 21 /PRNewswire-FirstCall/ -- Recent advances by major semiconductor manufacturers to develop 45 nanometer (nm) semiconductor chips have been made possible through the use of high-k materials in the gate dielectric. Air Products produces and markets a variety of high-k precursors which are used to deposit defect-free gate dielectrics through chemical vapor deposition or atomic layer deposition. The use of high-k dielectrics in conjunction with metal gates...

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