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Texas Instruments and HPL Technologies to Address Characterization and Yield Issues for 65nm Processes.

Publication: PR Newswire
Publication Date: 26-MAY-05
Format: Online
Delivery: Immediate Online Access

Article Excerpt
SAN JOSE, Calif., May 26 /PRNewswire-FirstCall/ -- Texas Instruments and HPL Technologies, Inc. will present a co-authored paper titled, "Infrastructure for Successful BEOL Characterization and Yield Ramp at the 65nm Node and Below", at the 2005 International Interconnect Technology Conference (IITC).

To be presented at 1:00 p.m. on Monday, June 6, the paper will describe a back-end-of-line (BEOL) technology-development read-only memory (TDROM(TM))...

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