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...state-of-the-art and resolution a CD SEM platform, eCD 1 meets the CD metrology performance requirements for the 90-nm technology node and beyond, and is specifically designed for applications involving 193-nm lithography and very high aspect ratio (VHAR) structures. A 200-mm/300-mm bridge tool, eCD 1 is based on a new and highly stable platform and features the industry's highest throughput...
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