...uncertainty associated traditional overlay metrology sub-100-nm design rules. By providing data that correlates precisely to in-device overlay performance, Archer AIM enables lithographers to manage their processes with a higher degree of confidence, thereby achieving tighter overlay control. In addition to reducing the costly wafer rework and scrap associated with overlay errors, Archer AIM enables chip manufacturers to accelerate their transition to future technology nodes. Several leading chipmakers and industry consortiums have already adopted Archer AIM for developing their advanced processes.

Traditional metrics are no longer adequate at the 65-nm node. "As...

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