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Point-Source X-ray Lithography.

Publication: NDT Update
Publication Date: 01-JUN-02
Format: Online - approximately 971 words
Delivery: Immediate Online Access

Article Excerpt
JMAR Technologies, Inc. described recent breakthroughs and summarized the current status of its x-ray lithography program at the 46th International Conference on Electron, Ion and Photon Beam Technology & Nanofabrication (EIPBN), or the 'Three-Beam' Conference, at Anaheim, California, on May...

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...29, 2002.

In an invited talk before a peer group of leading experts in the lithography field, Daniel J. Fleming, president of JMAR/SAL NanoLithography, JMAR's lithography systems division and director of JMAR's x-ray lithography business, described the progress JMAR has made to date in developing a unique conventional-footprint x- ray lithography system.

To distinguish JMAR's very compact, low-cost point-source x-ray system from other x-ray lithography systems that use large, expensive synchrotron (SOR) x-ray sources, Fleming says, "Some of you may know this as a 'point-source' system. We call it 'PXL' to distinguish it from other forms of x-ray lithography that have been used in...

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