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Reports from C. Huang and colleagues advance knowledge in thin solid films.

Publication: Journal of Technology
Publication Date: 28-JUL-09
Format: Online
Delivery: Immediate Online Access

Article Excerpt
"The novel technique of plasma chemical vapor deposition without using vacuum chamber was investigated to deposit SiOx films on polymeric substrates through tetraethoxysilane (TEOS)/Air atmospheric-pressure plasma (APP) glow discharge. Depending on the proper deposition parameters, thin and smooth SiOx films on polycarbonate substrates were prepared," researchers in Chungli, Taiwan...

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