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ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated Circuits for Years to Come.

Publication: Journal of Technology
Publication Date: 28-JUL-09
Format: Online
Delivery: Immediate Online Access

Article Excerpt
ASML (NASDAQ:ASML) and Cymer, Inc. (NASDAQ:CYMI) formally announce the shipment of the world's first fully integrated laser-produced plasma (LPP) Extreme Ultraviolet (EUV) lithography source to ASML. Cymer's EUV source, the first of a multi-unit purchase agreement between the two companies, is currently being installed at ASML's Veldhoven headquarters where it will support integration and testing of next generation EUV lithography scanners.

Together with this shipment, Cymer announces achieving a record milestone of 75 watts of EUV lithography exposure power (full die exposure) and expects...

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