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ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated Circuits for Years to Come.

Publication: Business Wire
Publication Date: 13-JUL-09 		Format: Online
Delivery: Immediate Online Access

Article Excerpt
Cymer ships world's first LPP EUV lithography source to ASML

VELDHOVEN, the Netherlands & SAN DIEGO -- ASML (Nasdaq:ASML)(Amsterdam:ASML) and Cymer, Inc. (Nasdaq:CYMI) formally announce the shipment of the world's first fully integrated laser-produced plasma (LPP) Extreme Ultraviolet (EUV) lithography source to ASML. Cymer's EUV source, the first of a multi-unit purchase agreement between the two companies, is currently being installed at ASML's Veldhoven headquarters where it will support integration and testing of next generation EUV lithography scanners.

Together with this shipment, Cymer announces achieving a record milestone of 75 Watts of EUV lithography exposure power (full die exposure) and expects to scale to 100 Watts exposure power within the current quarter, enabling scanner throughput of 60 silicon wafers (300 mm/12 inch) per hour which is required for volume manufacturing with ASML's EUV technology. First shipments of production-capable EUV scanners from ASML are planned a year from now. The source concept will be capable of scaling over time to performance levels consistent with exposing more than 100 wafers per hour...

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