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Article Excerpt
Progress in microlithography has been measured in three spatial dimensions: resolution, overlay, and defocus, but, as in relativity, there is a fourth time-like dimension -- throughput. For most of history and most of the industry, larger throughput has seemed better. Exposure source and tool vendors have made great efforts to speed output, with the latest scanning steppers capable of producing >140 wafers/hour (wph). The resist and track companies have done their part, increasing photospeed and providing multipath tracks that try to keep up with the scanners. However, for many, such a large peak production capacity may not be that useful.
The problem is that the total...
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